Advanced Ceramic
Packaging Solutions

Thin Film Microcircuits

Where Microns Make the Difference

Thin film microcircuits deliver the ultimate combination of precision, signal integrity, and miniaturization on ceramic substrates. Using vacuum deposition and photolithographic patterning, conductor lines, resistive elements, and functional layers are defined with sub-micron control — enabling high-density, high-frequency circuits.
INCERAM manufactures thin film microcircuits on alumina (Al₂O₃), aluminum nitride (AlN), and other advanced ceramics for RF, microwave, optoelectronic, aerospace, and precision instrumentation applications.

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RF PERFORMANCE

Low Loss Structures

RELIABLE INTERCONNECTS

Solid Through-Holes

DESIGN FREEDOM

Any Geometry

MIS-READY CAVITIES

Precision pockets for die mounting

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Thin film microcircuits are produced by depositing metallic and resistive layers onto precision ceramic substrates using high-vacuum processes — magnetron sputtering, electron-beam evaporation, or resistive thermal evaporation — followed by photolithographic patterning to define the circuit geometry. This approach yields fine conductor line widths and gaps with high dimensional accuracy, enabling highly dense circuit layouts.


The substrate surface quality is fundamental to thin film performance. Before metallization, substrates can be polished, ensuring uniform film adhesion, consistent resistor behavior, and sharp feature definition. Standard substrate materials include 96% and 99.6% alumina (Al₂O₃) and aluminum nitride (AlN); other materials<ссылка> are also available upon request.


The typical thin film stack comprises:

  • An adhesion sublayer of Cr (typically Cr, 100~200 Ω/sq), ensuring robust bonding between the ceramic and the functional metallic layers.
  • A conductive layer of Cu (typically Cu, 1~8 µm), defining signal traces, ground planes, and pads.
  • A nickel barrier layer, followed by a protective and wire-bondable Au finish layer (1~4 µm) for soldering and assembly.

Thin film resistors can be formed from silicon-based alloy films with an exceptionally repeatable temperature coefficient of resistance (TCR). After deposition, resistor values are precisely adjusted by functional laser trimming to tolerances as tight as ±0.1%, making these circuits suitable for precision analog and mixed-signal designs.


Substrate preparation, laser and diamond machining, via formation, selective edge and end-face metallization, and division of panel formats into individual circuits are all performed in-house — allowing complete engineering support from initial design to finished component. A proprietary technology for forming precision cavities (recesses) in the ceramic body enables flush mounting of microwave MMICs and die components, achieving maximum die co-planarity with the metallization pattern and recess dimensional accuracy of ±5 µm.

  • Exceptional dimensional accuracy and repeatability
  • Superior performance in RF and microwave applications
  • Ultra-smooth surfaces for high-frequency stability
  • Tight resistor tolerances with laser trimming
  • Flexible material and metallization selection
  • Compact and high-density circuit layouts
  • Suitable for harsh and high-reliability environments
  • Selective metallization of faces, holes, vias, and edges
  • Precision cavity technology for flush MMIC die integration
  • Compatible with wire bonding, soldering, and flip-chip assembly
  • Full in-house process chain: substrate prep → metallization → patterning → finishing
  • RF and microwave hybrid integrated circuits (HIC / MIC)
  • mmWave and high-frequency signal routing substrates
  • Low-noise amplifiers and power amplifier modules
  • Radar and electronic warfare subsystems
  • Precision analog and mixed-signal hybrid circuits
  • Optoelectronic packaging and laser diode submounts
  • Space and aerospace electronics
  • Semiconductor test and measurement hardware
  • Medical imaging and diagnostic electronics
  • High-temperature precision instrumentation
Parameter Typical Extended
Substrate Materials Al₂O₃ (96%, 99.6%), AlN Ferrite, Quartz, Sapphire and others
Substrate Thickness 0.25; 0.38; 0.5; 0.63; 1.0 mm Any custom thickness from 0.1 mm
Adhesion Layer Cr V, Ti, and other systems on request
Conductor Layer Cu, 1–8 µm Al, Au, and other systems on request
Barrier Layer Ni (electro- or electroless)
Protective / Bonding Layer Au (electroplated), 1~4 µm or ENIG / ENIPIG
Film Resistors Silicon-alloy Other systems on request
Resistor Tolerance (after trimming) ±1% ±0.1%
Min. Line Width / Space 50 µm / 50 µm Down to 25 µm (design-dependent)
Metallized Vias + +
Selective Edge / End-face Metallization + +
Photoresist Protective Masks + +
Glass Protective Masks + +
Precision Cavity for MMIC Die +
Scribing, Laser & Diamond Cutting + +
Deposition Type Material Thickness, µm
Magnetron Aluminium 0.05~1.1
Magnetron Chromium 0.05~0.5
Magnetron Monel 0.05~0.5
Magnetron Vanadium 0.05~0.2
Magnetron Niobium 0.05~0.5
Magnetron Nichrome 0.05~0.5
Electron-beam Niobium 0.05~0.5
Electron-beam Vanadium 0.05~0.2
Electron-beam Nickel 0.1~0.5
Electron-beam Chromium 0.05~0.5
Electron-beam Aluminium 0.05~1.1
Electron-beam Gold 0.05~1.0
Electron-beam Titanium 0.05~1.0
Resistive Aluminium 0.05~1.5
Resistive Chromium 0.05~0.5
Resistive Nickel 0.1~0.3
Resistive Vanadium 0.05~0.2
Resistive Titanium 0.05~0.2
Resistive Gold 0.05~1.0

* Specific combinations can be configured to meet special electrical, thermal, or compatibility requirements. Contact our engineering team to discuss the optimal deposition stack for your application.

How do I choose the right substrate material?

Start with two parameters: dielectric constant (governs electrical performance) and thermal conductivity + CTE (critical for high-power designs where heat and mechanical stress matter). When in doubt, thicker substrates (~0.5 mm) are easier to handle and cheaper to process — departing from standard thicknesses should have a clear technical reason.

When does alumina work, and when should I switch to AlN?

Alumina is the right default for most low-to-medium power DC and microwave circuits — cost-effective, widely available, excellent surface quality. Move to aluminum nitride when thermal dissipation becomes the binding constraint: AlN offers much higher thermal conductivity and a good CTE match with silicon, making it the standard choice for high-power modules.

What substrates are best for millimeter-wave frequencies?

Fused silica and quartz — extremely low dielectric loss and, in the case of quartz, very low CTE. Sapphire is also an option when high mechanical strength or optical properties are additionally required.

Do you work with ferrites, titanates, and other specialty materials?

Yes. We process ferrite substrates for circulators and isolators, and titanate ceramics for high-dielectric-constant applications. If your material isn't in our standard list, just ask.

What are the main cost drivers for thin film substrates?

Several factors compound: material type (specialty substrates like quartz or sapphire cost more than alumina); surface finish (polished > lapped > as-fired); substrate thickness (non-standard adds cost); panel size; metallization stack (number of layers, choice of metals — Au-based systems cost more than Cu; additional plating steps add to the total); circuit complexity (line density, vias, resistor trimming requirements); and any post-processing such as dicing, edge metallization, or cavity formation. Discussing all of these early in the design process usually pays off.

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Review & Clarification

We carefully review your specifications and may contact you for clarification. We provide as much cooperation and communication as your project requires.

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Tailored Quotation

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Ongoing Support

After confirmation, we stay with you throughout production, delivery, and product use — ensuring reliable service and long-term cooperation.

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